| 2017 | ICCAD | A unified framework for simultaneous layout decomposition and mask optimization. | Yuzhe Ma, Jhih-Rong Gao, Jian Kuang, Jin Miao, Bei Yu |
| 2016 | ICCAD | MrDP: multiple-row detailed placement of heterogeneous-sized cells for advanced nodes. | Yibo Lin, Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, Natarajan Viswanathan, Wen-Hao Liu, Zhuo Li, Charles J. Alpert, David Z. Pan |
| 2015 | DAC | PARR: pin access planning and regular routing for self-aligned double patterning. | Xiaoqing Xu, Bei Yu, Jhih-Rong Gao, Che-Lun Hsu, David Z. Pan |
| 2014 | ASPDAC | Self-aligned double patterning layout decomposition with complementary e-beam lithography. | Jhih-Rong Gao, Bei Yu, David Z. Pan |
| 2014 | DAC | MOSAIC: Mask Optimizing Solution With Process Window Aware Inverse Correction. | Jhih-Rong Gao, Xiaoqing Xu, Bei Yu, David Z. Pan |
| 2013 | ASPDAC | L-shape based layout fracturing for e-beam lithography. | Bei Yu, Jhih-Rong Gao, David Z. Pan |
| 2013 | DAC | E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system. | Bei Yu, Kun Yuan, Jhih-Rong Gao, David Z. Pan |
| 2013 | ICCAD | Methodology for standard cell compliance and detailed placement for triple patterning lithography. | Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, David Z. Pan |
| 2012 | ICCAD | Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper). | Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan |
| 2011 | DAC | AENEID: a generic lithography-friendly detailed router based on post-RET data learning and hotspot detection. | Duo Ding, Jhih-Rong Gao, Kun Yuan, David Z. Pan |
| 2008 | ASPDAC | A new global router for modern designs. | Jhih-Rong Gao, Pei-Ci Wu, Ting-Chi Wang |
| 2007 | ASPDAC | A Fast and Stable Algorithm for Obstacle-Avoiding Rectilinear Steiner Minimal Tree Construction. | Pei-Ci Wu, Jhih-Rong Gao, Ting-Chi Wang |