Tobias Kamps
Publication record assembled from the DBLP archive of ranked conferences.
Papers indexed
1
Venues
1
Active years
2020–2020
Best venue rank
C
Where they publish
Papers
1 indexed papers, newest first.
| Year | Venue | Title | Authors |
|---|---|---|---|
| 2020 | ICMLA | Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing. | Raven Reisch, Tobias Hauser, Benjamin Lutz, Matteo Pantano, Tobias Kamps, Alois C. Knoll |