Robust via-programmable ROM design based on 45nm process considering process variation and enhancement Vmin and yield.

Byung-Jun Jang, Chan-Ho Lee, Sung-Hun Sim, Kyu-Won Choi, Do-Hun Byun, Yeon-Ho Jung, Ki-Man Park, Dong-Yeon Heo, Gyu-Hong Kim, Joon-Sung Yang

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