| 2015 | ASPDAC | Polynomial time optimal algorithm for stencil row planning in e-beam lithography. | Daifeng Guo, Yuelin Du, Martin D. F. Wong |
| 2015 | ASPDAC | Contact pitch and location prediction for Directed Self-Assembly template verification. | Zigang Xiao, Yuelin Du, Martin D. F. Wong, He Yi, H.-S. Philip Wong, Hongbo Zhang |
| 2014 | DAC | Directed Self-Assembly (DSA) Template Pattern Verification. | Zigang Xiao, Yuelin Du, Haitong Tian, Martin D. F. Wong, He Yi, H.-S. Philip Wong, Hongbo Zhang |
| 2014 | DATE | Optimization of standard cell based detailed placement for 16 nm FinFET process. | Yuelin Du, Martin D. F. Wong |
| 2014 | ICCAD | Triple patterning aware detailed placement with constrained pattern assignment. | Haitong Tian, Yuelin Du, Hongbo Zhang, Zigang Xiao, Martin D. F. Wong |
| 2013 | ASPDAC | Linear time algorithm to find all relocation positions for EUV defect mitigation. | Yuelin Du, Hongbo Zhang, Qiang Ma, Martin D. F. Wong |
| 2013 | DAC | Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography. | Yuelin Du, Qiang Ma, Hua Song, James P. Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong |
| 2013 | ICCAD | Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library. | Yuelin Du, Daifeng Guo, Martin D. F. Wong, He Yi, H.-S. Philip Wong, Hongbo Zhang, Qiang Ma |
| 2013 | ICCAD | Constrained pattern assignment for standard cell based triple patterning lithography. | Haitong Tian, Yuelin Du, Hongbo Zhang, Zigang Xiao, Martin D. F. Wong |
| 2013 | ICCAD | Optimally minimizing overlay violation in self-aligned double patterning decomposition for row-based standard cell layout in polynomial time. | Zigang Xiao, Yuelin Du, Haitong Tian, Martin D. F. Wong |
| 2012 | ASPDAC | Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design. | Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Kai-Yuan Chao |
| 2012 | ASPDAC | Efficient pattern relocation for EUV blank defect mitigation. | Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Onur Topaloglu |
| 2012 | ICCAD | Layout small-angle rotation and shift for EUV defect mitigation. | Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Yunfei Deng, Pawitter Mangat |
| 2011 | ASPDAC | Mask cost reduction with circuit performance consideration for self-aligned double patterning. | Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Kai-Yuan Chao |
| 2011 | DAC | Self-aligned double patterning decomposition for overlay minimization and hot spot detection. | Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Onur Topaloglu |