Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography.
Yuelin Du, Qiang Ma, Hua Song, James P. Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong
Browse the full DAC paper archive.
Yuelin Du, Qiang Ma, Hua Song, James P. Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong
Browse the full DAC paper archive.